发明名称 支持方法、これを用いた高温処理方法、及び支持治具
摘要 A method for supporting a support to which a wafer is attached, by supporting the support against gravitational force by supporting three or more support points of an inner circumference section of a support surface of the support. The support surface of the support is opposite to a side on which the wafer is attached to the support.
申请公布号 JP5654901(B2) 申请公布日期 2015.01.14
申请号 JP20110042954 申请日期 2011.02.28
申请人 发明人
分类号 H01L21/683;H01L21/31 主分类号 H01L21/683
代理机构 代理人
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