| 摘要 |
The present invention relates to a pattern forming method comprising: (1) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) of which the polarity increases by the action of an acid and thereby the solubility in a developer containing an organic solvent decreases and a compound (B) which generates an acid which is represented by the following general formula (I) by irradiation with actinic rays or radiation; (2) exposing the film; and (3) forming a negative-type pattern by developing with a developer which contains an organic solvent, the actinic ray-sensitive or radiation-sensitive resin composition and the resist film which are used in the method, a method for preparing an electronic device and the electronic device. |
