发明名称 |
SCANNING ELECTRON MICROSCOPE |
摘要 |
It is an object of the present invention to provide a scanning electron microscope for discriminating an angle of an electron ejected from a sample without providing an opening for restricting the angle at outside of an axis. In order to achieve the object described above, there is proposed a scanning electron microscope which includes a deflector to deflect an irradiating position of an electron beam, and a control unit to control the deflector, and further includes a detector to detecting an electron provided by irradiating a sample with the electron beam, an opening configuring member arranged between the detector and the deflector and having an opening for passing the electron beam, and a secondary signal deflector to deflect an electron ejected from the sample, in which the secondary signal deflector is controlled to deflect the electron ejected from the sample toward an opening of passing the electron beam in accordance with a deflection control of the deflector. |
申请公布号 |
US2015014531(A1) |
申请公布日期 |
2015.01.15 |
申请号 |
US201314379704 |
申请日期 |
2013.02.18 |
申请人 |
HITACHI HIGH-TECHNNOLOGIES COPRORATION |
发明人 |
Yamazaki Minoru;Kazumi Hideyuki;Sasaki Yuko;Suzuki Makoto |
分类号 |
H01J37/147;H01J37/244;H01J37/28 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
|
主权项 |
1. A scanning electron microscope comprising:
an electron source; a deflector to deflect a position of irradiating an electron beam emitted from the electron source; and a control unit to control the deflector, the scanning electron microscope further including: a first detector to detect an electron provided by irradiating a sample with the electron beam; an opening configuring member arranged between the first detector and the deflector and having an opening for passing the electron beam; and a secondary signal deflector to deflect the electron ejected from the sample, wherein the control device controls the secondary signal deflector to deflect the electron ejected from the sample toward the opening for passing the electron beam in accordance with a deflecting control of the deflector. |
地址 |
Tokyo JP |