发明名称 |
SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
A supporting member is configured to support at least one pipe connecting a temperature adjusting unit with a substrate processing apparatus, wherein the temperature adjusting unit adjusts a temperature of an arbitrary component of the substrate processing apparatus, wherein an inside of the supporting member includes a hollow portion and the at least one pipe is arranged in the hollow portion. |
申请公布号 |
US2015013938(A1) |
申请公布日期 |
2015.01.15 |
申请号 |
US201414326614 |
申请日期 |
2014.07.09 |
申请人 |
Tokyo Electron Limited |
发明人 |
YOSHIMURA Akihiro;KITAZAWA Takashi;MASUDA Yasushi |
分类号 |
F28F9/013;F28F9/007 |
主分类号 |
F28F9/013 |
代理机构 |
|
代理人 |
|
主权项 |
1. A supporting member that is configured to support at least one pipe connecting a temperature adjusting unit with a substrate processing apparatus,
wherein the temperature adjusting unit adjusts a temperature of an arbitrary component of the substrate processing apparatus, wherein an inside of the supporting member includes a hollow portion and the at least one pipe is arranged in the hollow portion. |
地址 |
Tokyo JP |