发明名称 SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS
摘要 A supporting member is configured to support at least one pipe connecting a temperature adjusting unit with a substrate processing apparatus, wherein the temperature adjusting unit adjusts a temperature of an arbitrary component of the substrate processing apparatus, wherein an inside of the supporting member includes a hollow portion and the at least one pipe is arranged in the hollow portion.
申请公布号 US2015013938(A1) 申请公布日期 2015.01.15
申请号 US201414326614 申请日期 2014.07.09
申请人 Tokyo Electron Limited 发明人 YOSHIMURA Akihiro;KITAZAWA Takashi;MASUDA Yasushi
分类号 F28F9/013;F28F9/007 主分类号 F28F9/013
代理机构 代理人
主权项 1. A supporting member that is configured to support at least one pipe connecting a temperature adjusting unit with a substrate processing apparatus, wherein the temperature adjusting unit adjusts a temperature of an arbitrary component of the substrate processing apparatus, wherein an inside of the supporting member includes a hollow portion and the at least one pipe is arranged in the hollow portion.
地址 Tokyo JP