发明名称 |
METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE WITH A LATERAL PATTERN FOR APPLICATION IN THE XUV WAVELENGTH RANGE, AND BF AND LMAG STRUCTURES MANUFACTURED ACCORDING TO THIS METHOD |
摘要 |
Method for manufacturing a multilayer structure with a lateral pattern, in particular of an optical grating for application in an optical device for electromagnetic radiation with a wavelength in the wavelength range between 0.1 nm and 100 nm, comprising the steps of (i) providing a multilayer structure, and (ii) arranging a lateral three-dimensional pattern in the multilayer structure, wherein step (ii) of arranging the lateral pattern is performed by means of a method for nano-imprint lithography (NIL), and BF and LMAG structures manufactured according to this method. |
申请公布号 |
EP2510397(B1) |
申请公布日期 |
2015.01.14 |
申请号 |
EP20100796182 |
申请日期 |
2010.12.08 |
申请人 |
PANALYTICAL B.V. |
发明人 |
BIJKERK, FREDERIK;VAN DER WIEL, WILFRED GERARD;VAN DER MEER, ROBERT;HEGEMAN, PETRONELLA EMERENTIANA |
分类号 |
G03F7/00;G02B5/08;G03F1/24;G21K1/06 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|