| 摘要 |
<p>PURPOSE: A substrate storing device and a substrate processing device are provided to store a wafer for a long time by suppressing the formation of a floating layer on the wafer. CONSTITUTION: A receiving container(110) vertically receives a plurality of wafers with multi-stage. A diffusion plate(120) is formed in the receiving container to cover the upper side of a plurality of the wafers. The diffusion plate includes a plurality of penetration holes passing through the diffusion plate in a thickness direction. The diffusion plate uniformly diffuses the inactive gas from an air supply outlet(130) in a horizontal plane. The air supply outlet and an exhaust pipe are formed on the lower side of the receiving container. The air supply outlet supplies the inactive gas to the air supply region(A1). The exhaust pipe exhausts the atmosphere of the receiving container from an exhaust area.</p> |
