| 摘要 |
PROBLEM TO BE SOLVED: To surely detect an endpoint even if plasma processing is stopped. SOLUTION: A light emission detection unit 31 detects the light emission intensity in plasma processing. A waveform storage unit 33 stores the light emission waveform corresponding to the time change of the detected light emission intensity. A determination unit 35 determines that an endpoint has been reached when the light emission waveform is equal to or smaller than the light emission threshold set at a certain value and when the time change exceeds the setting time set at a certain value. An output unit 36 outputs the result that the plasma processing has reached the endpoint, to a high frequency power source 12 of an etching device 10. If the plasma processing is stopped before reaching the setting time and thereafter the processing is resumed, a monitor 30 couples, in a waveform coupling unit 34, the light emission waveform stored in the waveform storage unit 33 with the light emission waveform in the resumed processing. The determination unit 35 determines the endpoint on the basis of the coupled waveform. COPYRIGHT: (C)2012,JPO&INPIT |
