| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas. |
| 申请公布号 |
US2015015858(A1) |
申请公布日期 |
2015.01.15 |
| 申请号 |
US201414504191 |
申请日期 |
2014.10.01 |
| 申请人 |
ASML NETHERLANDS B.V. ;CARL ZEISS SMT AG |
发明人 |
HOOGENDAM Christiaan Alexander;LOOPSTRA Erik Roelof;STREEFKERK Bob;GELLRICH Bernhard;WURMBRAND Andreas |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithographic apparatus, comprising:
a movable table; a projection system configured to project the patterned beam onto a target portion of a substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid; and a gas flow port configured to create a flow of gas to remove humid gas in a space above and in contact with the liquid, to confine the humid gas in the space, or both. |
| 地址 |
Veldhoven NL |
