发明名称 |
NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A semiconductor storage device is disclosed. The semiconductor device includes a semiconductor substrate; and a gate electrode disposed above the semiconductor substrate. The gate electrode includes a conductive film, a metal film, and a first insulating film. In a cross sectional view of the gate electrode, at least the metal film includes a receding portion receding in a lateral direction as compared to the first insulating film, and wherein a second insulating film is disposed in the receding portion and contacts sidewalls of the metal film. |
申请公布号 |
US2015014762(A1) |
申请公布日期 |
2015.01.15 |
申请号 |
US201414177622 |
申请日期 |
2014.02.11 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
OHNUKI Ryota |
分类号 |
H01L29/423;H01L21/28;H01L29/788 |
主分类号 |
H01L29/423 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor storage device comprising:
a semiconductor substrate; and a gate electrode disposed above the semiconductor substrate; wherein the gate electrode includes a conductive film, a metal film, and a first insulating film and wherein, in a cross sectional view of the gate electrode, at least the metal film includes a receding portion receding in a lateral direction as compared to the first insulating film, and wherein a second insulating film is disposed in the receding portion and contacts sidewalls of the metal film. |
地址 |
Minato-ku JP |