发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor storage device is disclosed. The semiconductor device includes a semiconductor substrate; and a gate electrode disposed above the semiconductor substrate. The gate electrode includes a conductive film, a metal film, and a first insulating film. In a cross sectional view of the gate electrode, at least the metal film includes a receding portion receding in a lateral direction as compared to the first insulating film, and wherein a second insulating film is disposed in the receding portion and contacts sidewalls of the metal film.
申请公布号 US2015014762(A1) 申请公布日期 2015.01.15
申请号 US201414177622 申请日期 2014.02.11
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OHNUKI Ryota
分类号 H01L29/423;H01L21/28;H01L29/788 主分类号 H01L29/423
代理机构 代理人
主权项 1. A semiconductor storage device comprising: a semiconductor substrate; and a gate electrode disposed above the semiconductor substrate; wherein the gate electrode includes a conductive film, a metal film, and a first insulating film and wherein, in a cross sectional view of the gate electrode, at least the metal film includes a receding portion receding in a lateral direction as compared to the first insulating film, and wherein a second insulating film is disposed in the receding portion and contacts sidewalls of the metal film.
地址 Minato-ku JP