| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to obtain the colored pattern without color stains by coating a substrate with a photosensitive color composition and prebaking it and after patternwise exposure and development, and then, postbaking it and irradiating it with ultraviolet rays. SOLUTION: The substrate is coated with the photosensitive color composition and prebaked and patternwise exposed and developed and post treated, that is, post backed and irradiated with ultraviolet rays, thus permitting a color filter free from color stains to be formed, even if the postbaking is operated at a comparatively low temperature 80-170 deg.C, and therefore, it is made easy to apply this pigment dispersed product to a film substrate or the like limited in high temperature treatment because of its material, and further its application to a device material and the like necessary to avoid high temperature. |
