感活性光線性または感放射線性樹脂組成物、膜及び該組成物を用いたパターン形成方法

摘要

PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition with which a pattern having an excellent exposure latitude (EL) and a good pattern profile and line edge roughness (LER) can be formed, and to provide a active ray-sensitive or radiation-sensitive film formed by using the composition and a method for forming a pattern using the composition.SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having solubility with an alkali developing solution increased by action of an acid; (B) a compound that generates an acid expressed by general formula (B-1) by irradiation with active rays or radiation; and (C) a compound (PDA) that generates a compound expressed by general formula (PDA-1) by irradiation with the active rays or radiation.