| 摘要 |
<p>Disclosed is a radiation-sensitive composition that is used in step 1 of a method for forming a resist pattern that contains: (1) a step for forming a first resist pattern on a substrate using a first radiation-sensitive composition; (2) a step for insolubilizing the first resist pattern with respect to a second radiation-sensitive composition; and (3) a step for using the second radiation-sensitive composition to form a second resist pattern on the substrate whereupon the first resist pattern had been formed. The radiation-sensitive composition contains: (A) a polymer containing a repeating unit that has an acid labile group; (B) a polymer containing a repeating unit that has a fluorine atom, and a repeating unit that has a crosslinking group; (C) a radiation-sensitive acid generator; and (D) a solvent.</p> |
