发明名称 スピン注入電極構造、スピン伝導素子及びスピン伝導デバイス
摘要 <p>The present invention provides a spin injection electrode structure, a spin transport element, and a spin transport device which enable effective spin injection in a silicon channel layer at room temperature. A spin injection electrode structure IE comprises a silicon channel layer 12, a first magnesium oxide film 13A disposed on a first part of the silicon channel layer 12, and a first ferromagnetic layer 14A disposed on the first magnesium oxide film 13A. The first magnesium oxide film 13A partly includes a first lattice-matched part P lattice-matched with both of the silicon channel layer 12 and the first ferromagnetic layer 14A.</p>
申请公布号 JP5651826(B2) 申请公布日期 2015.01.14
申请号 JP20100198159 申请日期 2010.09.03
申请人 发明人
分类号 H01L29/82;G11B5/39;H01L21/8246;H01L27/105 主分类号 H01L29/82
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