| 摘要 |
PROBLEM TO BE SOLVED: To prevent dropping of applied liquid, which is left on a nozzle after application. SOLUTION: In applying developer, the developer is circulated with a flow rate which is 500-700 ml/min in a circulating path 30, and the developer is prevented from flowing down from a slit-shaped discharge port 4a. Then, a valve 33 is closed or narrowed, or the flow rate is increased to 1500-3000 ml/min by a pump 35, so that the developer can be applied along almost a whole face on a glass substrate like a curtain shape from the slit-shaped discharge port 4a. |
