| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a coating apparatus for forming a uniform film of a coating agent on a three-dimensional structure, and to provide a coating method. <P>SOLUTION: After the coating agent is supplied to a storage chamber 21 and a semiconductor device 40 is immersed, the coating agent is recovered from the storage chamber 21 and applied to the semiconductor device 40. Then, the semiconductor device 40 on which the coating agent is applied by a rotation drive part 38 is driven and rotated together with a storage tank 11 at the predetermined rotating speed set for every thickness of the desired coating agent. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
