| 摘要 |
<p>The present invention relates to a substrate processing apparatus capable of preventing pollution due to a discharge head and a nozzle arm for holding the discharge head, and a substrate processing method. Nozzle arms (62) for holding discharge heads are moved by a pivotal driving part (63) to a space between a processing position above a substrate (W) and a standby position outside a processing cup surrounding the substrate (W). When the nozzle arms (62) having cleaned a substrate (W) is placed at the standby position, a cleaning solution is ejected from a shower nozzle (71) toward the nozzle arms (62) arranged obliquely downward of the shower nozzle (71). The three nozzle arms (62) are moved up and down such that the nozzle arms cut across a jet of a cleaning solution discharged obliquely downward, thereby cleaning the three nozzle arms (62) in order. Then, a nitrogen gas is ejected from a drying gas nozzle (76) and sprayed to the nozzle arms (62) to remove the cleaning solution attached to the nozzle arms (62), thereby drying the nozzle arms (62).</p> |
