发明名称 SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To improve the precision of measurement of form or size to pattern by a scanning electron microscope by performing a dimensional measurement on the basis of the result obtained by adding and averaging the scanning lines in the area between a plurality of regulated boundary lines. SOLUTION: The emitted electron beam 2 of an electron source 1 is converged by a convergent lens 3 or an objective lens 5 and focused on a sample 6. The beam 2 is two-dimensionally deflected by a deflection coil 4 operated according to the signal of a deflection generator 9 according to the control command by an electronic computer 13 to scan the sample 6. The signal of the secondary electron 7 generated from the sample 6 is detected by a detector 8, stored in an image memory 10 after A/D conversion, and also D/A converted to image-display it on a CRT 14 as a luminance modulation signal. In an automatic measurement by a scanning microscope, addresses of upper and lower ends in an area to be averaged are calculated according to a prescribed expression. Since the form or size of a pattern or the state of the patter edge can be confirmed by a test image, and the setting of area is allowed to perform the comparison with a sample image, the measurement precision can be improved.
申请公布号 JPH11316115(A) 申请公布日期 1999.11.16
申请号 JP19990056609 申请日期 1999.03.04
申请人 HITACHI LTD 发明人 ARIMA JUNTARO
分类号 H01J37/22;G01B15/00;(IPC1-7):G01B15/00 主分类号 H01J37/22
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