发明名称 ナノインプリント用のモールドの離型処理方法およびそれを用いた製造方法並びにモールド、ナノインプリント方法およびパターン化基板の製造方法
摘要 A mold release processing method for a mold (1) includes: preparing a mold release processing substrate (5) coated with a mold release agent (6); causing a mold main body (12) having adsorbed water (2) on the surface thereof and the mold release processing substrate (5) to approach each other until a contact state in which the upper portions of protrusions of pattern (13) of protrusions and recesses are in contact with the mold release agent (6); maintaining the contact state until mold release layer (14), having a thickness distribution in which the thickness of the mold release layer (14) at the side surface (Ss) of the pattern (13) of protrusions and recesses becomes thinner from the top of surfaces (St) of the protrusions toward the bottom surfaces (Sb) of the recesses due to the mold release agent (6) becoming diffused in the adsorbed water (2), is formed; and causing the mold main body (12) and the mold release processing substrate (5) to move away from each other such that the upper portions of the protrusions separate from the mold release agent (6) on the mold release processing substrate (5).
申请公布号 JP5653864(B2) 申请公布日期 2015.01.14
申请号 JP20110178747 申请日期 2011.08.18
申请人 发明人
分类号 B29C33/38;B29C33/58;B29C59/02;H01L21/027 主分类号 B29C33/38
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