发明名称 PRODUCTION METHOD FOR FLEXIBLE SUBSTRATE
摘要 <p>A method of producing a flexible substrate which grows a metal bump (16) by using a mask film patterned by a photolithography process. When an opening is formed in a polyimide film without using a laser beam, a fine opening can be formed accurately thus enabling a fine metal bump (16) to be formed accurately. After the metal bump (16) is formed, the mask film is removed, a liquid resin material is applied before drying to form a coat and the coat is cured to form a resin film. The tip end of the metal bump (16) can be exposed if the surface is etched during the coat forming process.</p>
申请公布号 WO2000007419(P1) 申请公布日期 2000.02.10
申请号 JP1999004067 申请日期 1999.07.29
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