发明名称 |
APPARATUS FOR RECEIVING WAFER FOR EXPOSURE APPARATUS |
摘要 |
PURPOSE: An apparatus for receiving a wafer is provided to receive a wafer in a slot below a slot guide even when the wafer is caught in the slot guide as well as to reduce the loss of working time due to the inferiority of wafer sending. CONSTITUTION: An apparatus(100) receives a wafer(50) whose exposure process is completed in a wafer cassette(60). The apparatus includes: a belt driving part(10) which comprises a belt fixing block(14) and a plurality of pully installed on both sides of the belt fixing block and a belt(34) wound on the pully, and which receives the wafer in the wafer cassette arranged on an end part of the proceeding direction of the belt with the rotation of the belt according to the rotation of the pully; a belt supporting plate(20) which supports the belt fixing block, being installed on a bottom part of the belt fixing block; and an elastic part(40) which is installed between the belt fixing block and the belt supporting plate in a vertical direction as to the belt proceeding direction provides an elasticity to the belt fixing block.
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申请公布号 |
KR20000024740(A) |
申请公布日期 |
2000.05.06 |
申请号 |
KR19980041397 |
申请日期 |
1998.10.01 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOO, HEI YONG;KIM, JONG KWAN |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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