Active matrix substrate, production method, and display device

摘要

Disclosed is an active matrix substrate (5) on which pixels, each having a thin film transistor (18) and a pixel electrode (19) connected to the thin film transistor (18), are disposed in a matrix, and that includes a base material (5a) on which the pixels in a matrix are formed. In a contact hole portion (H), by anodically oxidizing a three-layered metal film (metal film) (21), an anodic oxidation film (29) is formed on the three-layered metal film (21) so as to fill a contact hole of a protective layer (27), with an end portion of the anodic oxidation film (29) being placed under an insulating layer (28). In the contact hole portion (H), the pixel electrode (19) and the three-layered metal film (21) are connected to each other via the anodic oxidation film (29).

主权项

1. An active matrix substrate on which pixels, each having a thin film transistor and a pixel electrode connected to the thin film transistor, are disposed in a matrix, and that includes a base material on which the pixels in a matrix are formed,
wherein, on the base material, a metal film connecting a drain electrode of the thin film transistor and the pixel electrode, a protective layer formed so as to cover the metal film, and an insulating layer formed on the protective layer are disposed, in each of the protective layer and the insulating layer, a contact hole of a contact hole portion connecting the pixel electrode and the metal film is provided, in the contact hole portion, an anodic oxidation film is formed on the metal film by anodically oxidizing the metal film so as to fill the contact hole of the protective layer with an end portion of the anodic oxidation film being placed under the insulating layer, and in the contact hole portion, the pixel electrode and the metal film are connected to each other via the anodic oxidation film.