发明名称 |
METHOD OF MANUFACTURING A MAGNETORESISTIVE DEVICE |
摘要 |
<p>A method of manufacturing a magnetoresistive-based device includes a metal hard mask that is inert to a top electrode etch chemistry and that has low sputter yield during a magnetic stack sputter. The metal hard mask is patterned by the photo resist and the photo mask is then stripped and the top electrode (overlying magnetic materials of the magnetoresistive-based device) is patterned by the metal hard mask.</p> |
申请公布号 |
KR20150004889(A) |
申请公布日期 |
2015.01.13 |
申请号 |
KR20147033104 |
申请日期 |
2013.04.26 |
申请人 |
EVERSPIN TECHNOLOGIES, INC. |
发明人 |
DESHPANDE SARIN;AGGARWAL SANJEEV;NAGEL KERRY |
分类号 |
H01L43/12;G11C11/15;H01L21/027 |
主分类号 |
H01L43/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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