发明名称 Gas supply apparatus equipped with vaporizer
摘要 An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device.
申请公布号 US8931506(B2) 申请公布日期 2015.01.13
申请号 US200912935870 申请日期 2009.02.17
申请人 Fujikin Incorporated 发明人 Nagata Atsushi;Nagase Masaaki;Hidaka Atsushi;Hirata Kaoru;Matsumoto Atsushi;Nishino Kouji;Dohi Ryousuke;Ikeda Nobukazu
分类号 F16K49/00;B01J4/02;B01B1/00;C23C16/448;C23C16/455;F02M21/06;F02M21/02;F02D19/02 主分类号 F16K49/00
代理机构 Griffin & Szipl, P.C. 代理人 Griffin & Szipl, P.C.
主权项 1. A gas supply apparatus equipped with a vaporizer, the gas supply apparatus comprising: (a) a liquid receiving tank; (b) a vaporizer disposed to vaporize liquid pressure-fed from the liquid receiving tank to the vaporizer; (c) a high-temperature type pressure type flow rate control device disposed to adjust a flow rate of outflow gas from the vaporizer, wherein the high-temperature type pressure type flow rate control device comprises a control valve, a driving section, an orifice, an arithmetic control device, a pressure detector and a temperature detector; (d) a plurality of heating devices disposed to heat the vaporizer, the high-temperature type pressure type flow rate control device, and portions of pipe passages connected to the vaporizer and to the high-temperature type pressure type flow rate control device; (e) a liquid supply control device disposed to adjust an amount of liquid to be pressure-fed to the vaporizer from the liquid receiving tank so that gas pressure on an upstream side of the high-temperature type pressure type flow rate control device reaches a predetermined setting pressure or higher; and (f) a temperature control device disposed to adjust a heating temperature of the vaporizer so that the gas pressure on the upstream side of the high-temperature type pressure type flow rate control device reaches the predetermined setting pressure or higher.
地址 Osaka JP