发明名称 Laser Processing Method for Manufacturing Semiconductor Packages
摘要 <p>PURPOSE: A laser processing method of a semiconductor package is provided to prevent the interface between adjacent holes due to thermal stress which is generated in a laser processing by forming holes over two pitches in oblique direction and row and column direction. CONSTITUTION: In a laser processing method of a semiconductor package, a plurality of holes(20) are formed in a first hole row by projecting laser beam by 2 pitches. A plurality of holes are formed in a second hole row by projecting laser beam by 2 pitches. Laser is projected between holes in the first hole to form holes by 2 pitches. Laser is projected between holes in the second hole to form holes by 2 pitches.</p>
申请公布号 KR101481080(B1) 申请公布日期 2015.01.13
申请号 KR20110065818 申请日期 2011.07.04
申请人 发明人
分类号 H01L21/78 主分类号 H01L21/78
代理机构 代理人
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