| 摘要 |
Disclosed is a dual-temperature, multi-plenum showerhead used in semiconductor equipment. The showerhead may supply multiple separate gases to a wafer reaction area while keeping the gases largely segregated within the showerhead. Additionally, the showerhead may be configured to allow a faceplate of the showerhead to be maintained at a significantly higher temperature than the rest of the showerhead. The showerhead used in semiconductor equipment includes a first plenum volume; a second plenum volume; a faceplate; and a plenum divider. |
