| 摘要 |
<p>A plasma processing apparatus related to the present invention includes an apparatus body; a process chamber which is installed at the apparatus body and performs a plasm process on an object in a vacuum state. The process chamber has a vacuum tube which has a hollow space for placing the object and is extended in a direction; a plasma generation part which is arranged in a position of the tube and makes plasma a gas supplied into the vacuum tube; an external vacuum shell which surrounds the vacuum tube and seals the external space of the vacuum tube; and a vacuum forming part which vacuumizes the external space and the vacuum tube.</p> |
