| 摘要 |
<p>Provided is a substrate cleaning apparatus capable of quickly removing cleaning liquid, which is used in cleaning a substrate, from the substrate by a roll cleaning tool. The substrate cleaning apparatus includes: a substrate holding part (71 to 75) to hold and rotate a substrate (W); a cleaning liquid supply nozzle (87) to supply cleaning liquid onto a first region (R1) of the substrate (W); a roll cleaning tool (77) making contact with the substrate (W) while sliding on the substrate (W) in the presence of the cleaning liquid to clean the substrate (W); and a fluid supply nozzle (88) to supply fluid, which is constituted by pure water or chemical liquid, onto a second region (R2) of the substrate (W). The second region (R2) is positioned at an opposite side of the first region (R1) with respect to the roll cleaning tool (77), and a supply direction of the fluid is a direction from a central side toward a peripheral side of the substrate (W).</p> |
