发明名称 GaN based HEMTs with buried field plates
摘要 A transistor with source and drain electrodes formed in contact with an active region and a gate between the source and drain electrodes and in contact with the active region. A first spacer layer is on at least part of the active region surface between the gate and drain electrodes and between the gate and source electrodes. The gate comprises a generally t-shaped top portion that extends toward the source and drain electrodes. A field plate is on the spacer layer and under the overhang of at least one section of the gate top portion. The field plate is at least partially covered by a second spacer layer that is on at least part of the first active layer surface and between the gate and drain and between the gate and source. At least one conductive path electrically connects the field plate to the source electrode or the gate.
申请公布号 US8933486(B2) 申请公布日期 2015.01.13
申请号 US201113245579 申请日期 2011.09.26
申请人 Cree, Inc. 发明人 Wu Yifeng
分类号 H01L29/778;H01L29/40;H01L29/423;H01L29/66;H01L29/812 主分类号 H01L29/778
代理机构 Koppel, Patrick, Heybl & Philpott 代理人 Koppel, Patrick, Heybl & Philpott
主权项 1. A transistor device, comprising: a semiconductor structure comprising an active region, said active region comprising a barrier layer; a source electrode in electrical contact with said semiconductor structure; a drain electrode in electrical contact with said semiconductor structure; and a gate between said source and drain electrodes, said gate comprising a vertical portion and a horizontal portion, said vertical portion in a recessed area of said barrier layer, said horizontal portion on said semiconductor structure and extending toward said drain on one side and toward said source on another side, wherein at least a portion of a space between said gate horizontal portion and said semiconductor structure is filled with air.
地址 Durham NC US