发明名称 |
One-time programmable device |
摘要 |
According to one embodiment, a one-time programmable (OTP) device having a lateral diffused metal-oxide-semiconductor (LDMOS) structure comprises a pass gate including a pass gate electrode and a pass gate dielectric, and a programming gate including a programming gate electrode and a programming gate dielectric. The programming gate is spaced from the pass gate by a drain extension region of the LDMOS structure. The LDMOS structure provides protection for the pass gate when a programming voltage for rupturing the programming gate dielectric is applied to the programming gate electrode. A method for producing such an OTP device comprises forming a drain extension region, fabricating a pass gate over a first portion of the drain extension region, and fabricating a programming gate over a second portion of the drain extension region. |
申请公布号 |
US8932912(B2) |
申请公布日期 |
2015.01.13 |
申请号 |
US201313945535 |
申请日期 |
2013.07.18 |
申请人 |
Broadcom Corporation |
发明人 |
Ito Akira;Chen Xiangdong |
分类号 |
H01L21/82;H01L29/78;H01L27/112;H01L23/525;H01L27/088;H01L29/66;H01L21/762;H01L29/49;H01L29/51 |
主分类号 |
H01L21/82 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A method for producing a one-time programmable (OTP) device having a lateral diffused metal-oxide-semiconductor (LDMOS) structure, said method comprising:
forming a drain extension region of said LDMOS structure; fabricating a pass gate including a pass gate electrode and a pass gate dielectric on a first portion of said drain extension region; and fabricating a programming gate including a programming gate electrode and a programming gate dielectric on a second portion of said drain extension region, wherein the programming gate is spaced from the pass gate based on two edges of the drain extension region; and said LDMOS device structure provides protection for said pass gate when a programming voltage for rupturing said programming gate dielectric is applied to said programming gate electrode. |
地址 |
Irvine CA US |