发明名称 Deposition and post-processing techniques for transparent conductive films
摘要 In one embodiment, a method is provided for fabrication of a semitransparent conductive mesh. A first solution having conductive nanowires suspended therein and a second solution having nanoparticles suspended therein are sprayed toward a substrate, the spraying forming a mist. The mist is processed, while on the substrate, to provide a semitransparent conductive material in the form of a mesh having the conductive nanowires and nanoparticles. The nanoparticles are configured and arranged to direct light passing through the mesh. Connections between the nanowires provide conductivity through the mesh.
申请公布号 US8932898(B2) 申请公布日期 2015.01.13
申请号 US201213350511 申请日期 2012.01.13
申请人 The Board of Trustees of the Leland Stanford Junior Univerity 发明人 Christoforo Mark Greyson;Mehra Saahil;Salleo Alberto;Peumans Peter
分类号 H01L31/18;H01L31/0224;B22F1/00;B22F3/24;B22F7/00;C23C4/12;C23C24/00;B82Y30/00;B22F3/00;C22C32/00 主分类号 H01L31/18
代理机构 Crawford Maunu PLLC 代理人 Crawford Maunu PLLC
主权项 1. A method, comprising: providing a first solution having conductive nanowires suspended therein and a second solution having nanostructures suspended therein; spraying the first and second solutions toward a substrate, and forming at least one mist therefrom, wherein the spraying is configured and arranged with droplets of the mist being sized so that the droplets do not evaporate prior to contacting the substrate; processing the at least one mist, while on the substrate, to provide a semitransparent conductive material in the form of a mesh having the conductive nanowires and nanoparticles, the nanoparticles configured and arranged to direct light passing and connections between the nanowires configured and arranged to provide a conductivity characteristic throughout the material; and providing the mesh as at least part of a film or layer, and wherein the mist formed from the solution includes droplets that upon reaching the substrate, do not coalesce on a surface of the substrate to form aggregations of nanowires or nanoparticles that cause non-uniformities in the film or layer.
地址 Palo Alto CA US