| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electron emission element of high precision, an image forming device and an electron beam lithography system which are capable of controlling and converging the emitted electron orbit, using a simple mechanism. SOLUTION: An opening hole region 6 is provided by removing a part of the electrode 4, in such a manner that it encloses the circumference of the electron-emitting region 5.</p> |
