发明名称 |
SUBSTRATE PROCESSING DEVICE AND METHOD FOR MAINTAINING SAME |
摘要 |
A substrate processing apparatus includes: a first processing chamber; a second processing chamber; a transfer chamber; a frame structure; and an elevating part. Each of the first and the second processing chamber has a main body part and a lid part. The transfer chamber is connected to the first and the second processing chamber and accommodates a transfer unit for transferring the substrate. The frame structure has a pair of column parts and a beam part supported at top portions of the column parts. The elevating part is coupled to the beam part to be moved in a horizontal direction and moves the lid part in the vertical direction. The beam part extends above the first and the second processing chamber and the transfer chamber. |
申请公布号 |
KR20150004326(A) |
申请公布日期 |
2015.01.12 |
申请号 |
KR20147026466 |
申请日期 |
2013.04.01 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SENZAKI SHIGERU;SAITO MICHISHIGE;SATOH DAIKI;HORIUCHI KEN;ANDO KOJI;KOIWA SHINGO |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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