发明名称 ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN-FORMATION METHOD USING SAME
摘要 According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes compound (A) that when exposed to actinic rays or radiation, generates acids and resin (B) that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. Compound (A) is expressed by general formula (I) below. Resin (B) contains at least one of repeating units of general formula (1) below.
申请公布号 KR20150004424(A) 申请公布日期 2015.01.12
申请号 KR20147034030 申请日期 2013.06.05
申请人 FUJIFILM CORPORATION 发明人 SHIBUYA AKINORI
分类号 G03F7/039;G03F7/004;H01L21/027 主分类号 G03F7/039
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