| 摘要 |
<p>A chemical vapor deposition apparatus for a flat panel display is provided. A chemical vapor deposition apparatus according to an embodiment of the present invention comprises: a lower chamber with a deposition space formed therein, on which a glass substrate for a deposition target flat panel display is arranged; an upper chamber which is combined with the lower chamber; a drawing frame which is arranged on the top of the upper chamber and is combined with the upper chamber so that at least a part of itself can relatively slide with respect to the upper chamber when the upper chamber is thermally expanded; and a center guide which is combined with the drawing frame and prevents the movement of the center of gravity of the drawing frame when the upper chamber is thermally expanded.</p> |
