| 摘要 |
FIELD: metallurgy.SUBSTANCE: invention refers to a device for surface etching for metallographic analysis of samples. The device includes a cell for etching and facilities insulating an etched zone from surrounding areas of the surface. At that the cell involves facilities for attachment to an etched object, and the specified insulating facilities are made as an elastic packing. Also the cell has an attached reservoir with an etching solution, a reservoir with a washing solution and an inlet pipe for collection of a waste solution.EFFECT: device structure ensures an improvement of the surface preparation cleanliness for analysis and results reproducibility, also it ensures the possibility of operation not only on horizontal, but on inclined and vertical surfaces of structural elements of operating equipment in the field as well.6 cl, 2 dwg |
