Substrate processing apparatus and method for manufacturing a semiconductor device employing same

摘要

In a substrate processing apparatus including a processing chamber for forming a processing room, a susceptor for supporting a substrate to be processed and a susceptor rotating unit for rotating the susceptor, the susceptor rotating unit includes a permanent magnet coupled with the susceptor and an electromagnet coupled with the processing chamber, wherein there is a spacing between the permanent magnet and the electromagnet. In the substrate processing apparatus, the inner part of the processing chamber is isolated from the atmosphere of the susceptor by the spacing between the permanent magnet and the electromagnet; and the susceptor is directly rotated by rotating the permanent magnet under a magnetic field formed by the electromagnet.