发明名称 |
POLYSILAZANE COATING FOR PHOTOVOLTAIC CELLS |
摘要 |
A method of fabricating a photovoltaic cell, and a device produced by such a method, are described. The method includes providing a semiconductor substrate and electrically coupling an electrically conductive article to a top surface of the semiconductor substrate. An anti-reflective coating is formed over the semiconductor substrate and the electrically conductive article, in which the anti-reflective coating has a plurality of sub-layers. Each of the sub-layers comprises polysilazane and has a different index of refraction from the other sub-layers. A photovoltaic cell is formed from the semiconductor substrate, the electrically conductive article and the anti-reflective coating. |
申请公布号 |
US2015007877(A1) |
申请公布日期 |
2015.01.08 |
申请号 |
US201414308691 |
申请日期 |
2014.06.18 |
申请人 |
GTAT CORPORATION |
发明人 |
Brainard Robert;Murali Venkatesan |
分类号 |
H01L31/0216;H01L31/048 |
主分类号 |
H01L31/0216 |
代理机构 |
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代理人 |
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主权项 |
1. A method of fabricating a photovoltaic cell, the method comprising:
providing a semiconductor substrate having a top surface; electrically coupling an electrically conductive article to the top surface of the semiconductor substrate; forming an anti-reflective coating over the electrically conductive article and the top surface of the semiconductor substrate, wherein the anti-reflective coating comprises a plurality of sub-layers, wherein each of the sub-layers comprises a polysilazane, and wherein the sub-layers have different indices of refraction from each other; and forming a photovoltaic cell from the semiconductor substrate, the electrically conductive article and the anti-reflective coating. |
地址 |
Merrimack NH US |