发明名称 POLYSILAZANE COATING FOR PHOTOVOLTAIC CELLS
摘要 A method of fabricating a photovoltaic cell, and a device produced by such a method, are described. The method includes providing a semiconductor substrate and electrically coupling an electrically conductive article to a top surface of the semiconductor substrate. An anti-reflective coating is formed over the semiconductor substrate and the electrically conductive article, in which the anti-reflective coating has a plurality of sub-layers. Each of the sub-layers comprises polysilazane and has a different index of refraction from the other sub-layers. A photovoltaic cell is formed from the semiconductor substrate, the electrically conductive article and the anti-reflective coating.
申请公布号 US2015007877(A1) 申请公布日期 2015.01.08
申请号 US201414308691 申请日期 2014.06.18
申请人 GTAT CORPORATION 发明人 Brainard Robert;Murali Venkatesan
分类号 H01L31/0216;H01L31/048 主分类号 H01L31/0216
代理机构 代理人
主权项 1. A method of fabricating a photovoltaic cell, the method comprising: providing a semiconductor substrate having a top surface; electrically coupling an electrically conductive article to the top surface of the semiconductor substrate; forming an anti-reflective coating over the electrically conductive article and the top surface of the semiconductor substrate, wherein the anti-reflective coating comprises a plurality of sub-layers, wherein each of the sub-layers comprises a polysilazane, and wherein the sub-layers have different indices of refraction from each other; and forming a photovoltaic cell from the semiconductor substrate, the electrically conductive article and the anti-reflective coating.
地址 Merrimack NH US