发明名称 APPARATUS AND METHODS FOR HIGH-RESOLUTION ELECTRON BEAM IMAGING
摘要 <p>One embodiment relates to an apparatus for high-resolution electron beam imaging. The apparatus includes an energy filter configured to limit an energy spread of the electrons in the incident electron beam. The energy filter may be formed using a stigmatic Wien filter and a filter aperture. Another embodiment relates to a method of forming an incident electron beam for a high-resolution electron beam apparatus. Another embodiment relates to a stigmatic Wien filter that includes curved conductive electrodes. Another embodiment relates to a stigmatic Wien filter that includes a pair of magnetic yokes and a multipole deflector. Other embodiments, aspects and features are also disclosed.</p>
申请公布号 KR20150003248(A) 申请公布日期 2015.01.08
申请号 KR20147030709 申请日期 2013.04.02
申请人 KLA-TENCOR CORPORATION 发明人 JIANG XINRONG;HAN LIQUN
分类号 H01J37/22;H01J37/10;H01J37/147 主分类号 H01J37/22
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