发明名称 LOW WAVEFRONT ABERRATION DEVICE AND SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an improved applanation lens for an ophthalmological operation.SOLUTION: There is provided an apparatus for performing ophthalmic surgery which comprises: a light source 10 configured to generate a light beam 11; a focusing lens 16 configured to focus the light beam, the focusing lens being configured such that the focused light beam has a focus area having a diameter of 15 μm or less within a cornea 6 of an eye 18; a contact glass element 4b configured to contact the eye 18 to be treated and having a transmission ratio of at least 90% relative to the focused light beam and comprising a material having an index of refraction in the range of 1.500 to 1.550, the contact glass element being configured to introduce a wavefront aberration of at most about λ/2 to the focused light beam when the focused light beam passes through the contact glass element; and optical means configured to direct the focused light beam having a focus area with a diameter of 15 mm or less repeatedly and successively over a treatment region within the cornea of the eye to form an incision in the cornea.
申请公布号 JP2015003024(A) 申请公布日期 2015.01.08
申请号 JP20140126767 申请日期 2014.06.20
申请人 WAVELIGHT GMBH 发明人 PETER TRIEBEL;OLAF KITTELMANN;VOGLER KLAUS
分类号 A61F9/008 主分类号 A61F9/008
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