EXPOSURE DRAWING DEVICE, RECORDING MEDIUM IN WHICH PROGRAM IS RECORDED, AND EXPOSURE DRAWING METHOD

摘要

This exposure drawing method is employed in an exposure drawing device provided with an exposure means that draws a circuit pattern by exposing a substrate to be exposed, which has a first surface and a second surface on the opposite side thereof to the first surface. The method comprises: a mark forming step for forming a first mark that forms a reference for an exposure position and is formed in a predetermined position on the second surface of the substrate to be exposed and for forming a second mark that represents identification information for identifying the substrate to be exposed by relative position by making the relative position thereof with respect to the first mark different for each substrate to be exposed; a first control step for controlling the exposure means such that a circuit pattern is drawn on the first surface of the substrate to be exposed; and a storage step for storing information regarding the first surface exposure in a storage means in correspondence with identification information represented by the relative positions.