发明名称 |
Electron Beam Data Storage System and Method for High Volume Manufacturing |
摘要 |
The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set; and exposing an energy sensitive layer to a charged particle beam based on the lookup table. |
申请公布号 |
US2015008343(A1) |
申请公布日期 |
2015.01.08 |
申请号 |
US201414491455 |
申请日期 |
2014.09.19 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
WANG HUNG-CHUN;CHEN PEI-SHIANG;LIN TZU-CHIN;KRECINIC FARUK;CHEN JENG-HORNG;HUANG WEN-CHUN;LIU RU-GUN |
分类号 |
H01J37/302;H01J37/317 |
主分类号 |
H01J37/302 |
代理机构 |
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代理人 |
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主权项 |
1. A particle beam apparatus comprising:
a particle beam source operable to generate at least one particle beam; a beam controller operable to selectively expose portions of a substrate to the at least one particle beam in response to a write instruction; and a data processing module operable to:
receive a design layout;generate a lookup table mapping a plurality of instances of a repeating pattern in the design layout to a single representation of the repeating pattern to thereby reduce a data size of the design layout; andgenerate the write instruction based on the lookup table. |
地址 |
Hsin-Chu TW |