发明名称 Electron Beam Data Storage System and Method for High Volume Manufacturing
摘要 The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set; and exposing an energy sensitive layer to a charged particle beam based on the lookup table.
申请公布号 US2015008343(A1) 申请公布日期 2015.01.08
申请号 US201414491455 申请日期 2014.09.19
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 WANG HUNG-CHUN;CHEN PEI-SHIANG;LIN TZU-CHIN;KRECINIC FARUK;CHEN JENG-HORNG;HUANG WEN-CHUN;LIU RU-GUN
分类号 H01J37/302;H01J37/317 主分类号 H01J37/302
代理机构 代理人
主权项 1. A particle beam apparatus comprising: a particle beam source operable to generate at least one particle beam; a beam controller operable to selectively expose portions of a substrate to the at least one particle beam in response to a write instruction; and a data processing module operable to: receive a design layout;generate a lookup table mapping a plurality of instances of a repeating pattern in the design layout to a single representation of the repeating pattern to thereby reduce a data size of the design layout; andgenerate the write instruction based on the lookup table.
地址 Hsin-Chu TW