EXPOSURE APPARATUS, INFORMATION MANAGEMENT APPARATUS, EXPOSURE SYSTEM, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To correct a variation of a focus measurement value even when a change of a substrate shape is generated in a process step after an exposure step and a change is generated in the focus measurement value.SOLUTION: An exposure apparatus for projecting a pattern of a mask illuminated by light from an illuminating optical system to a substrate held on a substrate stage by a projecting optical system includes: a measurement part for measuring a position of a face on the substrate in an optical axis direction of the projecting optical system; a storage part for storing a measurement value by the measurement part, an identification number of the substrate and processing layer information indicating a processing layer of the substrate in association with each other; a calculation processing part for acquiring a first measurement value of a position of a face of a first layer previously processed on the substrate from the storage part and calculating a difference between the acquired first measurement value and a second measurement value obtained by measuring a position of a face of a second layer on the first layer by the measurement part; and a control part for controlling a position of the substrate stage in the optical axis direction by using the calculated difference during the exposure of the second layer.