| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a coating method where defects caused by the ununiformity of coating due to the separation of a coating liquid can be sufficiently reduced and which is extremely useful for forming a high quality coating film on a substrate while the method is excellent in practicality and simple.SOLUTION: In a coating method where a coating device having a liquid reservoir to store a coating liquid is used and the surface of a substrate is coated with the coating liquid, the coating liquid contains a non-hygroscopic solvent.</p> |
