EXPOSURE WRITING DEVICE AND EXPOSURE WRITING METHOD

摘要

An exposure writing device is provided with: a first exposure means for writing a circuit pattern on a first face by exposure of the first face of a printed wiring board arranged on a stage; a mark forming means, arranged in a manner so as to be movable with respect to the stage, for forming a plurality of predetermined marks on a second face opposite to the first face during writing of the circuit pattern of the first face on the first face of the printed wiring board; a measurement means for measuring the position of the mark forming means; a detection means for detecting the position of a plurality of marks formed on the second face; and a second exposure means for writing a circuit pattern on the second face by exposure of the second face of the printed wiring board, using as a reference the measured position of the mark forming means and the positions of the plurality of marks that were thus detected.