发明名称 |
TIXSI1-XN LAYERS AND THEIR PRODUCTION THEREOF |
摘要 |
The invention relates to a workpiece having a coating, said coating comprising at least one TixSi1-xN layer, characterized in that x = 0.85 and the TixSi1-xN layer contains nanocrystals, the nanocrystals present having an average grain size of not more than 15 nm and having a (200) texture. The invention also relates to a process for producing the aforementioned layer, characterized in that the layer is produced using a sputtering process, in which current densities of greater than 0.2 A/cm2 arise on the target surface of the sputtering target, and the target is a TixSi1-xN target, where x = 0.85. An intermediate layer containing TiAlN or CrAlN is preferably provided between the TixSi1-xN layer and the substrate body of the workpiece. |
申请公布号 |
CA2916784(A1) |
申请公布日期 |
2015.01.08 |
申请号 |
CA20142916784 |
申请日期 |
2014.07.01 |
申请人 |
OERLIKON SURFACE SOLUTIONS AG, TRUBBACH |
发明人 |
KURAPOV, DENIS;KRASSNITZER, SIEGFRIED |
分类号 |
C23C14/06;C23C14/02;C23C14/34;C23C14/35 |
主分类号 |
C23C14/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|