发明名称 EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To accurately drive a stage in a desired direction during exposure and alignment.SOLUTION: During exposure, positional information of a stage WST is measured by a Y head 64 and an X head 66 which oppose Y scales 39Yand 39Yand X scales 39Xand 39Xand on the basis of measurement information of an encoder system including the heads 64 and 66, movement of the stage WST is controlled while compensating for a measurement error of the encoder system caused by displacement of the stage WST in a direction different from directions X and Y2. During alignment, positional information of the stage WST is measured by Y heads 64yand 64yof the encoder system opposing the Y scales 39Yand 39Y, respectively, and on the basis of measurement information of the encoder system, the movement of the stage WST is similarly controlled.
申请公布号 JP2015005761(A) 申请公布日期 2015.01.08
申请号 JP20140160338 申请日期 2014.08.06
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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