| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of easily coping with various requirement processing widths of an object to be processed. <P>SOLUTION: A first plasma production unit 10A wherein three or more electrodes 11, 12 extended in one direction are arranged in a direction perpendicular to the one direction and a discharge slit 14 is formed between adjacent electrodes and a second plasma production unit 10B having the same configuration as it are lined in a row and arranged diagonally to a movement direction of the object 90 to be processed. A relative locus of the discharge slit 14A at an end of the first plasma production unit 10A on the side of the second plasma production unit to the object to be processed and a relative locus of the discharge slit 14B at an end of the second plasma production unit 10B on the side of the first plasma production unit to the object to be processed are made continuous to each other. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
