发明名称 PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
摘要 Provided is a non-ionic photoacid generator having high i-line photosensitivity, excellent heat-resistant stability, and excellent solubility in hydrophobic materials. The present invention is a non-ionic photoacid generator (A) that is characterized by being expressed by general formula (1). [In formula (1), R1 and R2 each independently represents an alkyl group having 1-18 carbons or a fluoroalkyl group having 1-18 carbons, an alkenyl group having 2-18 carbons, an alkynyl group having 2-18 carbons, an aryl group having 6-18 carbons, a silyl group, or the like; m and n respectively represent the number of R1s and R2s, each number being an integer from 0 to 3, and the total number (m+n) of R1s and R2s being an integer from 1 to 6. The m number of R1s and the n number of R2s may each be the same or different. R3 represents a hydrocarbon having 1-18 carbons (wherein one part or all of the hydrogen may be substituted by fluorine).]
申请公布号 WO2015001804(A1) 申请公布日期 2015.01.08
申请号 WO2014JP03545 申请日期 2014.07.03
申请人 SAN-APRO LTD. 发明人 IKEDA, TAKUYA;KIMURA, HIDEKI;SHIBAGAKI, TOMOYUKI;OKA, MASAAKI
分类号 C09K3/00;C07D221/14;C08K5/42;C08L101/00;G03F7/004;G03F7/038;H01L21/027 主分类号 C09K3/00
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