| 摘要 |
The present invention relates to a monomer for hardmask composition expressed by chemical formula 1, a hardmask composition including the same and a method for forming patterns using the same. A, A′, A″, L, L′, X, X′, m and n of chemical formula 1 have the same definition as in the patent specification. |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
PARK, YU SHIN;KIM, SANG KYUN;KIM, YUN JUN;KIM, GO UN;KIM, YOUNG MIN;KIM, HEA JUNG;MOON, JOON YOUNG;PARK, YO CHOUL;PARK, YOU JUNG;SONG, HYUN JI;SHIN, SEUNG WOOK;YOON, YONG WOON;LEE, CHUNG HEON;CHOI, YOO JEONG;HONG, SEUNG HEE |
