| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate treatment device and a method for treating the same for keeping a degree of cleanliness by preventing adhesion of liquid drop mist discharged from a nozzle to a part of a circumference of the nozzle. <P>SOLUTION: A substrate treatment device 1 for cleaning a substrate by supplying a mist of liquid drops to the substrate includes a couple of fluid nozzles 21, 22 for discharging the mist of liquid drops and a cover 30 surrounding the couple of fluid nozzles 21, 22 for preventing a scattering of the mist of liquid drops discharged from the couple of fluid nozzles. A front end of an external circumferential part 70 of the cover 30 has an aperture 90 for supplying the mist of liquid drops discharged from the couple of fluid nozzles 21, 22 to a substrate W. A gap G is formed between the front end of the external circumferential part 70 and the substrate W. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
